The sputtering of trapped gas from tungsten
K Erents; B Navinsek; G Carter; K Erents; Department of Electrical Engineering and Electronics, University of Liverpool; B Navinsek; Department of Electrical Engineering and Electronics, University of Liverpool; G Carter; Department of Electrical Engineering and Electronics, University of Liverpool
Журнал:
British Journal of Applied Physics
Дата:
1967-05-01
Аннотация:
0.5 and 2 kev Kr<sup>+</sup> ions were injected into polycrystalline tungsten. The gas-loaded target was then bombarded with Ar<sup>+</sup> ions with energies between 0.1 and 4 kev and the rate of release of Kr and the fraction of Kr released after a given Ar<sup>+</sup> ion dose were measured. Effective gas sputtering coefficients were then deduced and a comparison of the form of their variation with Ar<sup>+</sup> ion energy with the known variation of the sputtering coefficient of tungsten suggests that the gas release is not conditioned wholly by target erosion. It is believed that some of the gas release is a result of localized heating effects which occur near the point of ion impact (thermal spikes) and cause an enhancement of thermally induced gas desorption.
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